发明名称 |
FLOATING GATE INCLUDING HETEROMETAL NANOCRYSTALS, MANUFACTURING METHOD FOR THE SAME, AND SEMICONDUCTOR DEVICE HAVING THE SAME |
摘要 |
PURPOSE: A floating gate which includes hetero metal nano crystal, a manufacturing method thereof, and a semiconductor device which includes the floating gate are provided to control the particle size and density of the metal nano crystal, thereby easily controlling charge capacity. CONSTITUTION: A floating gate for a semiconductor device stores charge by being arranged between a tunneling oxide film and control oxide film. A plurality of first metal nano crystals(30) is arranged in the tunneling oxide film. A first self-assembled monolayer(SAM,40) is arranged in the tunneling oxide film in which the first metal nano crystal is arranged. A plurality of second metal nano crystals(50) is arranged in the first self-assembled monolayer.
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申请公布号 |
KR20110121573(A) |
申请公布日期 |
2011.11.07 |
申请号 |
KR20110040495 |
申请日期 |
2011.04.29 |
申请人 |
KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION |
发明人 |
LEE, JAE GAB;LEE, CHI YOUNG;KIM, A RA |
分类号 |
H01L21/8247;H01L27/115 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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