发明名称 FLOATING GATE INCLUDING HETEROMETAL NANOCRYSTALS, MANUFACTURING METHOD FOR THE SAME, AND SEMICONDUCTOR DEVICE HAVING THE SAME
摘要 PURPOSE: A floating gate which includes hetero metal nano crystal, a manufacturing method thereof, and a semiconductor device which includes the floating gate are provided to control the particle size and density of the metal nano crystal, thereby easily controlling charge capacity. CONSTITUTION: A floating gate for a semiconductor device stores charge by being arranged between a tunneling oxide film and control oxide film. A plurality of first metal nano crystals(30) is arranged in the tunneling oxide film. A first self-assembled monolayer(SAM,40) is arranged in the tunneling oxide film in which the first metal nano crystal is arranged. A plurality of second metal nano crystals(50) is arranged in the first self-assembled monolayer.
申请公布号 KR20110121573(A) 申请公布日期 2011.11.07
申请号 KR20110040495 申请日期 2011.04.29
申请人 KOOKMIN UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION 发明人 LEE, JAE GAB;LEE, CHI YOUNG;KIM, A RA
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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