发明名称 METHOD OF MEASURING CRYSTALLITE DIAMETER OF THIN FILM MATERIAL, MEASURING OBJECTIVE SAMPLE, AND METHOD OF MANUFACTURING MEASURING OBJECTIVE SAMPLE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of measuring a crystallite diameter of a thin film material for easily measuring the crystallite diameter of the thin film material by X-ray diffraction measurement with high precision, a measuring objective sample for performing the X-ray diffraction measurement of the thin film, and a method of manufacturing the measuring objective sample. <P>SOLUTION: The measuring objective sample is constituted by stacking ten test samples in each of which a thin film is formed on a film, and putting a standard powder sample between a test sample 1J which is closest to a side where an X-ray enters and a test sample 1I which is second closest to the side. The X-ray diffraction measurement of the measuring objective sample is performed with a transmission method. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2011220989(A) 申请公布日期 2011.11.04
申请号 JP20100114474 申请日期 2010.05.18
申请人 SUMITOMO METAL MINING CO LTD 发明人 HAYASHI KAZUHIDE
分类号 G01N23/20 主分类号 G01N23/20
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