| 摘要 |
<p>PURPOSE: An active ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the same are provided to improve the line width roughness and/or pattern collapse performance of patterns by suppressing the generation of a swelling phenomenon in an alkaline-based developing process. CONSTITUTION: An active ray-sensitive or radiation-sensitive resin composition includes a resin and compounds. The resin includes a repeating unit with the partial structure of chemical formula I. The dissolving speed of the resin with respect to an alkaline developing solution is increased by the action of acid. One compound includes a proton acceptable functional group. The compound generates a compound, in which the characteristic is converted from proton acceptable into acidic, or reduces or loses the proton acceptable characteristic by the irradiation of active ray or radiation. Another compound generates acid by the irradiation of active ray or radiation.</p> |
