发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
<p>An immersion lithographic apparatus has adaptations (23,27,28,29,30,31,32) to prevent or reduce bubble formation in one or more gaps (22) in the substrate table by preventing bubbles (24) escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.</p> |
申请公布号 |
EP1720074(B1) |
申请公布日期 |
2011.11.02 |
申请号 |
EP20060252309 |
申请日期 |
2006.04.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STREEFKERK, BOB;DONDERS, SJOERD NICOLAAS LAMBERTUS;DE GRAAF, ROELOF FREDERIK;HOOGENDAM, CHRISTIAAN ALEXANDER;LEENDERS, MARTINUS HENDRIKUS ANTONIUS;MERTENS, JEROEN JOHANNES SOPHIA MARIA;RIEPEN, MICHEL |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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