发明名称 |
Film depositing apparatus, a film depositing method, a piezoelectric film, and a liquid ejecting apparatus |
摘要 |
A film depositing apparatus comprises: a process chamber; a target holder provided in the process chamber for holding a target; a substrate holder for supporting a deposition substrate such that the deposition substrate faces the target holder in the process chamber; a power supply for supplying electric power between the target holder and the substrate holder to generate plasma in the process chamber; and an anode provided between the target holder and the substrate holder for capturing ions and/or electrons in the plasma being generated within the process chamber, wherein the anode includes: a cylindrical member provided so as to surround an outer periphery of a side of the substrate holder that faces the target holder; and at least one annular plate member attached to an inside wall of the cylindrical member, the plate member having a central opening larger than a surface of the deposition substrate.
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申请公布号 |
US8047636(B2) |
申请公布日期 |
2011.11.01 |
申请号 |
US20090461463 |
申请日期 |
2009.08.12 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
FUJII TAKAMICHI;NAONO TAKAYUKI |
分类号 |
B41J2/045;C23C14/00 |
主分类号 |
B41J2/045 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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