| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target which is useful for high output density sputtering and contains an oxide having a high refractive index, and to provide a method of manufacturing the sputtering target.SOLUTION: The sputtering target has a composition composed of a matrix material comprising a first oxide and a metallic component, wherein the first oxide having a high refractive index is selected from a group of oxides consisting of titanium oxide, niobium oxide, vanadium oxide, yttrium oxide, molybdenum oxide, zirconium oxide, tantalum oxide, tungsten oxide and hafnium oxide which are in an arbitrary transformation, or a mixture of them. |
