METHOD FOR PRODUCING GLASS SUBSTRATE FOR MASK BLANK, METHOD FOR PRODUCING MASK BLANK, METHOD FOR PRODUCING REFLECTION TYPE MASK BLANK, METHOD FOR PRODUCING EXPOSURE MASK, METHOD FOR PRODUCING REFLECTION TYPE MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a glass substrate for mask blanks, by which surface roughening of the surface of the glass substrate is improved while maintaining or improving the flatness of the surface of the glass substrate, and high flatness and high smoothness are attained, in a polishing process after local surface processing.SOLUTION: The method for producing a glass substrate for mask blanks includes: an uneven shape measuring process of measuring an uneven shape in the surface to be measured and the rear surface of the glass substrate 1 for mask blanks and the variation of the thickness of the substrate; a flatness control process of controlling the flatness of the surface to be measured and the rear surface and the variation of the substrate thickness to a prescribed standard value or less by applying surface processing, based on the above measurement result; and a polishing process of polishing the glass substrate 1 subjected to the surface processing while pressing the glass substrate 1 to a polishing cloth 61 and further, pressing the polishing cloth 61 in the vicinity of the peripheral part of the glass substrate 1 by a polishing cloth pressing means 27 so that the pressing force distribution on the surface of the glass substrate 1 becomes uniform when rotating and polishing the glass substrate 1 while pressing the surface of the glass substrate 1 to the polishing cloth 61 by a substrate pressing means 67.