| 摘要 |
PROBLEM TO BE SOLVED: To further increase overall gas treatment capacity by generating plasma even in a space between adjacent gas treatment units.SOLUTION: A high voltage from a high voltage power source 5 is applied between a first electrode 8-1 as a ground electrode, and a second electrode 9-1 as a high voltage electrode, of a gas treatment unit GU1. The high voltage from the high voltage power source 5 is applied between a first electrode 8-2 as a high voltage electrode, and a second electrode 9-2 as a ground electrode, of another gas treatment unit GU2. As a result, a potential difference is generated between the facing electrodes, and plasma is generated even in the space between the adjacent gas treatment units (plasma is generated even in areas AR1 and AR2) to treat gas in the space (in the areas). |
