发明名称 ULTRAVIOLET RAY GAS LASER APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an ultraviolet ray gas laser apparatus, capable of preventing a predetermined gas component included in leaked laser gas from flowing into a casing of the ultraviolet ray gas laser apparatus, even when the laser gas leaks from a window of a laser chamber.SOLUTION: The ultraviolet ray gas laser apparatus includes a container, a purge circuit having a circuit that supplies purge gas into the container and a circuit for discharging the purge gas in the container, and a laser gas exhaust circuit for discharging the laser gas in the laser chamber. The purge circuit has a filter. The laser gas exhaust circuit is provided with a filter that captures the predetermined gas component separately from the filter of the purge circuit.
申请公布号 JP2011211234(A) 申请公布日期 2011.10.20
申请号 JP20110140962 申请日期 2011.06.24
申请人 GIGAPHOTON INC;USHIO INC 发明人 YASHIRO MASANORI;INOUE TOYOJI;FUJIMOTO JUNICHI
分类号 H01S3/036;H01S3/02 主分类号 H01S3/036
代理机构 代理人
主权项
地址