发明名称 Method for selectively amending layout patterns
摘要 A method to selectively amend a layout pattern is disclosed. First, a layout pattern including at least a first group and a second group is provided, wherein each one of the first group and the second group respectively includes multiple members. Second, a simulation procedure and an amendment procedure are respectively performed on all the members of the first group and the second group to obtain an amended first group and an amended second group. Then, the amended first group and the amended second group are verified as being on target or not. Afterwards, the layout pattern including the on target amended first group and the on target amended second group is output.
申请公布号 US8042069(B2) 申请公布日期 2011.10.18
申请号 US20080188192 申请日期 2008.08.07
申请人 UNITED MICROELECTRONICS CORP. 发明人 YANG YU-SHIANG;WU TE-HUNG;CHENG YUNG-FENG;YANG CHUEN HUEI;HUANG HSIANG-YUN;KUO HUI-FANG;KUO SHIH-MING;CHEN LUN-HUNG
分类号 G06F17/50 主分类号 G06F17/50
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