| 摘要 |
<p>Disclosed is a wavefront aberration measuring apparatus which comprises: an illumination optical system disposed on an incident side of a lens to be detected; and a measurement optical system disposed on an emission side of the lens to be detected, wherein the illumination optical system has an openable and closeable aperture diaphragm and is movable along the optical axis of the illumination optical system such that the aperture diaphragm and an entrance pupil surface of the lens to be detected are adjusted to positions which have an optically conjugate relationship with each other. Accordingly, the wavefront aberration measuring apparatus can suppress errors in measurement results.</p> |
