APPARATUS FOR CONDITIONING PAD, WAFER POLISHING APPARATUS HAVING THE SAME AND METHOD OF POLISHING WAFER,申请号KR20100029552-传众专利搜索

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发明名称	APPARATUS FOR CONDITIONING PAD, WAFER POLISHING APPARATUS HAVING THE SAME AND METHOD OF POLISHING WAFER
摘要
申请公布号	KR20110109707(A)	申请公布日期	2011.10.06
申请号	KR20100029552	申请日期	2010.03.31
申请人	LG SILTRON INCORPORATED	发明人	CHOI, CHUL HO
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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