STANDARD SAMPLE FOR FILM THICKNESS MEASUREMENT, METHOD OF MANUFACTURING THE SAME, METHOD OF MEASURING FILM THICKNESS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To improve stability of a film containing La, of a standard sample used for a film thickness measurement, during storage.SOLUTION: A standard sample for film thickness measurement 100 includes an La containing film 103 provided on a silicon substrate 101 and a protective film 105 provided on top of the La containing film 103 to cover the La containing film 103 and containing a metal nitride. This effectively suppresses a film thickness variation due to degradation of the film 103 containing La during storage. A method of measuring the film thickness is also provided including the step of correcting a measured value of the film thickness of the film containing La using such the standard sample for film thickness measurement 100.