发明名称 DEVICE FOR FORMING AND METHOD FOR FORMING MICRO-TEXTURED PATTERN, METHOD FOR PRODUCING TRANSFER SUBSTRATE, AND TRANSFER SUBSTRATE
摘要 <p>In one embodiment, the disclosed method for forming a micro-textured pattern is provided with: a transfer step wherein the micro-textured pattern of a mold is transferred to the resist layer of a transfer substrate on which the resist layer has been formed, and then curing the aforementioned transferred micro-textured pattern; and a detachment step wherein the aforementioned transfer substrate and the aforementioned mold are detached after the aforementioned transferred micro-textured pattern has been cured. The aforementioned detachment step is provided with: a first detachment step wherein pressure is applied to the back surface of the aforementioned transfer substrate while in the state of the edge section of the aforementioned transfer substrate being immobilized, thus bending the aforementioned transfer substrate into an arc and initiating the detachment of the aforementioned transfer substrate and the aforementioned mold by means of the bending of the aforementioned transfer substrate; and a second detachment step wherein the portion out of the aforementioned micro-textured pattern of micro-textured pattern that did not detach in the aforementioned first detachment step is detached by means of gradually decreasing the aforementioned applied pressure in a manner so as to undo the bending of the aforementioned transfer substrate. This method for producing a transfer substrate produces a transfer substrate by means of the aforementioned method of formation.</p>
申请公布号 WO2011122439(A1) 申请公布日期 2011.10.06
申请号 WO2011JP57178 申请日期 2011.03.24
申请人 FUJIFILM CORPORATION;OKADA, SHINICHIRO;OGAWA, SHOTARO 发明人 OKADA, SHINICHIRO;OGAWA, SHOTARO
分类号 B29C59/02;B29C33/44;H01L21/027 主分类号 B29C59/02
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