PROCESS FOR PRODUCTION OF OPTICAL VANADIUM DIOXIDE THIN FILM

摘要

Disclosed is a process for producing a thin film which contains vanadium dioxide as the main component and of which infrared ray transmissibility can be adjusted automatically in accordance with temperatures, in a simple manner even in the atmosphere at room temperature. The process is characterized in that a thin film comprising a precursor containing vanadium atoms is formed on a glass substrate and the thin film is irradiated with light such as a laser beam having a wavelength of 400 nm or less, thereby producing a thin film which contains vanadium dioxide as the main component and of which the infrared ray transmissibility can be adjusted automatically in accordance with temperatures without requiring the control of the gas atmosphere.