发明名称 Method of predicting substrate current in high voltage device
摘要 A method of predicting a substrate current in a high voltage device that may accurately predict substrate current components in each of a first region, a second region, and a third region. This may be accomplished by modeling a substrate current component in a third region, in which an inconsistency may occur when a substrate current in a high voltage device is calculated, for example using BSIM3-based modeling. According to embodiments, a substrate current for a third region may be modeled by an expression with a ternary operator, and the modeled substrate current may be added to a substrate current obtained through BSIM3-based modeling.
申请公布号 US8028261(B2) 申请公布日期 2011.09.27
申请号 US20080344383 申请日期 2008.12.26
申请人 DONGBU HITEK CO., LTD. 发明人 KWAK SANG-HUN
分类号 G06F17/50 主分类号 G06F17/50
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