发明名称 AUTOMATIC MATCHING UNIT AND PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To efficiently establish a substantial matching state in a short period of time without causing unnecessary speed reduction or hatching in automatic operation. <P>SOLUTION: In a second matching algorithm, an operating point Z<SB>p</SB>is moved along e.g., a route Z<SB>p</SB>(7), Z<SB>p</SB>(8), and Z<SB>p</SB>(9) on a C<SB>1</SB>coordinates axis or C<SB>2</SB>coordinates axis, based on a third reference line TC<SB>1S</SB>or TC<SB>2S</SB>perpendicular to a first or second reference line C<SB>1S</SB>or C<SB>2S</SB>as a target of operating point movement control on impedance coordinates. The coordinates position of the operating point Z<SB>p</SB>(9) reaches an available best quasi-matching point Z<SB>B</SB>extremely close to the origin O (the matching point Z<SB>S</SB>), and the movement of the operating point Z<SB>p</SB>is stopped at this position. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011182046(A) 申请公布日期 2011.09.15
申请号 JP20100042049 申请日期 2010.02.26
申请人 TOKYO ELECTRON LTD 发明人 ASHIDA MITSUTOSHI
分类号 H03H7/40;C23C16/509;H01L21/3065;H01L21/31;H05H1/00;H05H1/46 主分类号 H03H7/40
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