发明名称 Process and a device to clean substrates
摘要 In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90% volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device.
申请公布号 US8016949(B2) 申请公布日期 2011.09.13
申请号 US20090867261 申请日期 2009.01.27
申请人 CONOPCO INC. 发明人 JAYARAMAN SURESH SAMBAMURTHY;KAMKAR KIRTAN SHRAVAN;KUMAR LALIT;SAH AMIT;SHRESTH RUDRA SAURABH
分类号 B08B3/02 主分类号 B08B3/02
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