| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fluid handling structure for minimizing or preventing the sealing of bubbles within an immersion solution of an immersion lithographic apparatus. <P>SOLUTION: A fluid handling structure is for a lithographic apparatus. At a boundary from a space configured to include an immersion fluid to a region external to the fluid handling structure, the fluid handling structure successively has an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing. <P>COPYRIGHT: (C)2011,JPO&INPIT |
