| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system whereby the control accuracy of a scanner stability module is improved, while still making the same or a similar limited number of monitor wafers used as at present. <P>SOLUTION: A method for producing at least one monitor wafer for a lithographic apparatus is disclosed. The monitor wafer is used, in combination with a scanning control module to periodically retrieve a measured value defining a baseline from the monitor wafer, and thereby parameter drift from the baseline is determined. By doing so, the drift can be allowed and/or corrected. The baseline is determined by initially exposing the monitor wafers using the lithographic apparatus to perform multiple exposure passes on each of the monitor wafers. A related lithographic apparatus is also disclosed. <P>COPYRIGHT: (C)2011,JPO&INPIT |
