发明名称 Imprint lithography
摘要 A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
申请公布号 US8011915(B2) 申请公布日期 2011.09.06
申请号 US20060364497 申请日期 2006.03.01
申请人 ASML NETHERLANDS B.V. 发明人 SIMON KLAUS
分类号 B29C59/02 主分类号 B29C59/02
代理机构 代理人
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