发明名称 |
THIN FILM DEPOSITION VIA A SPATIALLY-COORDINATED AND TIME-SYNCHRONIZED PROCESS |
摘要 |
<p>A deposition system and process for the formation of thin film materials. In one embodiment, the process includes forming an initial plasma from a first material stream and allowing the plasma to evolve in space and/or time to extinguish species that are detrimental to the quality of the thin film material. After the initial plasma evolves to an optimum state, a second material stream is injected into the deposition chamber to form a composite plasma that contains a distribution of species more conducive to formation of a high quality thin film material. The deposition system includes a deposition chamber having a plurality of delivery points for injecting two or more streams (source materials or carrier gases) into a plasma region. The delivery points are staggered in space to permit an upstream plasma formed from a first material stream deposition source material to evolve before combining a downstream material stream with the plasma. Injection of different material streams is also synchronized in time. The net effect of spatial coordination and time synchronization of material streams is a plasma whose distribution of species is optimized for the deposition of a thin film photovoltaic material at high deposition rates. Delivery devices include nozzles and remote plasma sources.</p> |
申请公布号 |
KR20110099107(A) |
申请公布日期 |
2011.09.06 |
申请号 |
KR20117013727 |
申请日期 |
2009.12.14 |
申请人 |
OVSHINSKY INNOVATION, LLC |
发明人 |
OVSHINSKY STANFORD |
分类号 |
H01L21/205;H01L31/042;H01L31/18 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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地址 |
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