| 摘要 |
A method and an apparatus for forming a dielectric layer on a substrate are described, in which a plasma is produced from a process gas between a plasma electrode and the substrate, resulting in an at least partial chemical reaction between the substrate and the process gas and/or an at least partial deposition of process gas components in order to form the dielectric layer on the substrate. The term 'plasma electrode' designates a unit consisting of two electrodes, preferably arranged at a defined distance from each other. In the method, the distance between the plasma electrode and the substrate is modified during the chemical reaction and/or the deposition of the process gas components. An apparatus for carrying out said method is also described. |
