| 摘要 |
In the production of a blank made of titanium-doped glass having a high silicic acid content for a mirror substrate for use in EUV lithography, it is known to generate the Ti-doped silica glass by means of flame hydrolysis of starting substances containing silicon and titanium and to subsequently adjust a predefined hydrogen content in the Ti-doped silica glass. In order to achieve the greatest possible insensitivity of the surface to distortions and deformations when irradiated with EUV laser radiation proceeding from this, a method is proposed according to the invention, in which a soot body made of titanium-doped SiO2 is generated by flame hydrolysis, the soot body is dried by heating it to a temperature of at least 1150°C in a vacuum so that a mean hydroxyl group content of less than 150 ppm by weight is adjusted, the dried soot body is sintered forming a preform made of Ti-doped silica glass, and the Ti-doped silica glass is loaded with hydrogen so that a mean hydrogen content of at least 1 x 1016 molecules/cm3 is adjusted. |
