发明名称 PURIFYING METHOD AND PURIFYING APPARATUS FOR ARGON GAS
摘要 The present invention provides a practical method for reducing load of an afterward absorption treatment, reducing energy required in refining and refining high-purity argon gas through effectively reducing impurity content of the argon gas. When the argon gas which at least contains oxygen, hydrogen, carbon monoxide and nitrogen as impurities, the molar concentration of the oxygen in the nitrogen gas is set to a value which exceeds a summation between the molar concentration of carbon monoxide and the molar concentration of hydrogen. Afterwards, the oxygen is caused to react with the carbon monoxide and the hydrogen for generating carbon oxide and water with a state of residual oxygen. Afterwards, the water content is reduced through dewatering operation. Then, the oxygen and carbon oxide in the impurities are at least adsorbed through a pressure revolving adsorption method of carbon adsorbent, and afterwards, nitrogen in the impurities is adsorbed at least through a thermal revolving adsorption method at the temperature of -10 DEG C to -50 DEG C.
申请公布号 KR20110097648(A) 申请公布日期 2011.08.31
申请号 KR20110014598 申请日期 2011.02.18
申请人 SUMITOMO SEIKA CHEMICALS CO., LTD. 发明人 NAKATANI MITSUTOSHI;KISHII MITSURU;SAKAMOTO JUN ICHI;KITAGISHI NOBUYUKI
分类号 C01B23/00;B01D53/047;C01B5/00;C01B31/20 主分类号 C01B23/00
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