发明名称 |
Semiconductor device including a MOSFET and a Schottky junction |
摘要 |
A semiconductor device, including a MOSFET, has a plurality of transistor cell regions disposed in a semiconductor substrate. A source electrode of the MOSFET is disposed over a main surface of the semiconductor substrate and is in contact with a top surface of a source region in each of the plurality of transistor cell regions. A drain electrode of the MOSFET is a disposed over a back surface of the semiconductor substrate and is electrically connected to the semiconductor substrate. A Schottky cell region is disposed between the plurality of transistor cell regions in the semiconductor substrate. The source electrode is in contact with a part of the main surface of the semiconductor so as to form a Schottky junction in the Schottky cell region.
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申请公布号 |
US8008714(B2) |
申请公布日期 |
2011.08.30 |
申请号 |
US20100901929 |
申请日期 |
2010.10.11 |
申请人 |
RENESAS ELECTRONICS CORPORATION |
发明人 |
SHIRAI NOBUYUKI;MATSUURA NOBUYOSHI;NAKAZAWA YOSHITO |
分类号 |
H01L29/76;H01L29/872;H01L21/8234;H01L27/04;H01L27/088;H01L27/095;H01L29/06;H01L29/08;H01L29/10;H01L29/40;H01L29/45;H01L29/47;H01L29/78;H01L31/0336;H01L31/062 |
主分类号 |
H01L29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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