发明名称 Methods for fabricating micro-electro-mechanical devices
摘要 A method for fabricating a micro-electro-mechanical device (such as a cMUT) is disclosed. The method combines a substrate, a middle spring layer and a top plate using wafer bonding technology or sacrificial technology. A cavity is formed on either the top of the substrate or the bottom of the middle spring layer. A connector is formed on either the top of the middle spring layer or the bottom of the top plate. Upon joining the three layers, the connector defines a transducing space between the top plate and the middle spring layer. The connector is horizontally distanced from the sidewall to define a cantilever anchored at the sidewall. The cantilever and the cavity allow a vertical displacement of the connector, which transports the top wafer in a piston-like motion to change the transducing space. Multiple device elements can be made on the same substrate.
申请公布号 US8008105(B2) 申请公布日期 2011.08.30
申请号 US20060914594 申请日期 2006.05.18
申请人 KOLO TECHNOLOGIES, INC. 发明人 HUANG YONGLI
分类号 H01L21/00 主分类号 H01L21/00
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