发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To improve reliability of a semiconductor device by preventing occurrence of a short circuit between leads caused by separation of a residual resin formed on a side face of the lead or a lower side of the lead. <P>SOLUTION: By irradiating an intra-dam resin formed in a dam portion 12a surrounded by leads 3 adjacent to each other, a dam bar 12 and a sealing body 2 with a laser beam a plurality of times respectively from a principal surface side of the lead 3 and the back face side of the lead 3, the intra-dam resin formed on the side faces of the lead 3 or the lower part of the lead 3 is completely removed. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011166000(A) 申请公布日期 2011.08.25
申请号 JP20100028705 申请日期 2010.02.12
申请人 RENESAS ELECTRONICS CORP 发明人 AMAUCHI TOMOJI;OKABE TOSHIYUKI
分类号 H01L21/56;H01L23/50 主分类号 H01L21/56
代理机构 代理人
主权项
地址