WASHING LIQUID COMPOSITION FOR DEPOSITION MATERIAL AND WASHING METHOD USING THE SAME

摘要

PURPOSE: A cleaning solution composition for deposition materials is provided to shorten the time of a production process and to save production costs by rapidly removing the deposition materials attached to the production apparatus of an electric optical device. CONSTITUTION: A cleaning solution composition for deposition materials comprises: 5-80 weight% of N-methyl-2-pyrrolidone; and 20-95 weight% of 1,3-dimethyl-2-imidazolidinone. A cleaning method comprises a step of removing the deposition materials attached to the production apparatus of an electric optical device using the cleaning solution composition for deposition materials.