发明名称 ORGANIC THIN FILM FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an organic thin film forming method increasing an angle of contact of pure water with a surface of the organic thin film without increasing the content of a highly hydrophobic component. <P>SOLUTION: The organic thin film forming method includes a coating step of coating an organic solution containing a first component and a second component which is higher in hydrophobicity than the first component on a substrate, and a heat-treating step of heat-treating the coated organic solution after the coating step to form a film. The coating step includes: a first step of dropping the organic solution onto the substrate and unifying the thickness of the dropped organic solution in an atmosphere that contains vapor of an evaporated liquid under a first vapor pressure; and a second step of unifying the thickness of the dropped organic solution in an atmosphere that contains the vapor of the evaporated liquid under a second vapor pressure higher than the first vapor pressure after the first step. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011165700(A) 申请公布日期 2011.08.25
申请号 JP20100023216 申请日期 2010.02.04
申请人 TOSHIBA CORP 发明人 NAKA YOSHISUKE
分类号 H01L21/027;B05D1/26;B05D3/02;G03F7/16 主分类号 H01L21/027
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