发明名称 Field effect transistor using oxide film for channel and method of manufacturing the same
摘要 The present invention provides a field effect transistor including an oxide film as a semiconductor layer, wherein the oxide film includes one of a source part and a drain part to which one of hydrogen and deuterium is added.
申请公布号 US8003981(B2) 申请公布日期 2011.08.23
申请号 US20070282000 申请日期 2007.08.03
申请人 CANON KABUSHIKI KAISHA 发明人 IWASAKI TATSUYA;KUMOMI HIDEYA
分类号 H01L29/12 主分类号 H01L29/12
代理机构 代理人
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