| 发明名称 |
CALIBRATION OF LITHOGRAPHIC APPARATUS. |
| 摘要 |
<p>System parameters are checked through self-assessment of a production wafer without using a reference or a monitor wafer. In particular, the wafer is exposed at different orientations, the data from which provides for the calibration of system parameters.</p> |
| 申请公布号 |
NL2006078(A) |
申请公布日期 |
2011.08.22 |
| 申请号 |
NL20112006078 |
申请日期 |
2011.01.27 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MENCHTCHIKOV, BORIS;PADIY, ALEXANDRE VIKTOROVYCH |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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