| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a pellicle film for forming the pellicle film that is used for a pellicle for lithography and has a uniform film thickness. <P>SOLUTION: In the method for manufacturing the pellicle film, a spin coating device drops solution containing a pellicle film material to the center of a rotating substrate 5 to form a coating film on the substrate 5, evaporates a volatile component in the coating film, and forms the pellicle film used for the pellicle for lithography on the substrate. In a process of evaporating the volatile component in the coating, the in-plane temperature distribution of the substrate 5 is controlled. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
