发明名称 |
Method of Measuring Overlay Error and a Device Manufacturing Method |
摘要 |
The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
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申请公布号 |
US2011200246(A1) |
申请公布日期 |
2011.08.18 |
申请号 |
US200913055594 |
申请日期 |
2009.07.27 |
申请人 |
VAN DE KERKHOF MARCUS ADRIANUS;VERSTAPPEN LEONARDUS HENRICUS MARIE |
发明人 |
VAN DE KERKHOF MARCUS ADRIANUS;VERSTAPPEN LEONARDUS HENRICUS MARIE |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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