发明名称 VISUAL INSPECTING SYSTEM USING ELECTRON BEAM
摘要 <P>PROBLEM TO BE SOLVED: To provide a visual inspecting system which can implement efficient inspection in a short time by speedily acquiring to inspect image data including only a desired part. <P>SOLUTION: In the visual inspecting system with an ROI inspection function, image data for forming reference image is cut out including an aligning margin from a scanning stripe image arranged on a semiconductor wafer, based on a region specifying condition set. The plurality of image data cut out are added to average to compose the reference image for the ROI inspection. Also, misdetermination is prevented by providing a predetermined prohibition condition when cutting out the image data for the reference image. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011158439(A) 申请公布日期 2011.08.18
申请号 JP20100022653 申请日期 2010.02.04
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KASHIMA KAZUKI;MOMIYAMA YOSHIYUKI;IIZUMI KEN;YASUMOTO HIDEKI;SUZUKI KOSUKE
分类号 G01N23/225;H01L21/027 主分类号 G01N23/225
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