发明名称 |
PHOTOCURABLE COMPOSITION |
摘要 |
A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.
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申请公布号 |
US2011200950(A1) |
申请公布日期 |
2011.08.18 |
申请号 |
US200913120457 |
申请日期 |
2009.06.12 |
申请人 |
HUNTSMAN INTERNATIONAL LLC |
发明人 |
DUDDE KAI;PIERAU SABINE;ROTH MARTIN |
分类号 |
C08G63/91;C08G59/17;C08L63/04;G03F7/20 |
主分类号 |
C08G63/91 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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