发明名称 PHOTOCURABLE COMPOSITION
摘要 A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.
申请公布号 US2011200950(A1) 申请公布日期 2011.08.18
申请号 US200913120457 申请日期 2009.06.12
申请人 HUNTSMAN INTERNATIONAL LLC 发明人 DUDDE KAI;PIERAU SABINE;ROTH MARTIN
分类号 C08G63/91;C08G59/17;C08L63/04;G03F7/20 主分类号 C08G63/91
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