发明名称 |
ELECTRONIC DEVICE INCLUDING DOPED REGIONS BETWEEN CHANNEL AND DRAIN REGIONS AND A PROCESS OF FORMING THE SAME |
摘要 |
<p>PURPOSE: An electronic device including doping areas between a channel and a drain area and a manufacturing method thereof are provided to reduce injection blocking possibility from a sacrificial member on a sacrificial spacer by reflowing the sacrificial member. CONSTITUTION: A drain area of a transistor(12) has a first conductive type. A channel area of the transistor has a second conductive type which is opposite to the first conductive type. A doping area is extended from the drain area to the channel area. A second doping area is arranged between the first doping area and the channel area. A gate electrode of the transistor is combined with control terminals(162,164) of a control unit(16).</p> |
申请公布号 |
KR20110092221(A) |
申请公布日期 |
2011.08.17 |
申请号 |
KR20110010043 |
申请日期 |
2011.02.01 |
申请人 |
SEMICONDUCTOR COMPONENTS INDUSTRIES, L.L.C. |
发明人 |
LOECHELT GARY H.;GRIVNA GORDON M. |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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