发明名称 ELECTRONIC DEVICE INCLUDING DOPED REGIONS BETWEEN CHANNEL AND DRAIN REGIONS AND A PROCESS OF FORMING THE SAME
摘要 <p>PURPOSE: An electronic device including doping areas between a channel and a drain area and a manufacturing method thereof are provided to reduce injection blocking possibility from a sacrificial member on a sacrificial spacer by reflowing the sacrificial member. CONSTITUTION: A drain area of a transistor(12) has a first conductive type. A channel area of the transistor has a second conductive type which is opposite to the first conductive type. A doping area is extended from the drain area to the channel area. A second doping area is arranged between the first doping area and the channel area. A gate electrode of the transistor is combined with control terminals(162,164) of a control unit(16).</p>
申请公布号 KR20110092221(A) 申请公布日期 2011.08.17
申请号 KR20110010043 申请日期 2011.02.01
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, L.L.C. 发明人 LOECHELT GARY H.;GRIVNA GORDON M.
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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