| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition for forming a pattern excellent in sensitivity, resolution and roughness characteristics and having a good shape, and to provide a method for forming a pattern using the composition. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a resin that includes a first repeating unit having a first structural moiety that is decomposed by irradiation with actinic rays or radiation to generate an acid, and a second repeating unit having a second structural moiety that is decomposed by an action of an acid to generate sulfonic acid. <P>COPYRIGHT: (C)2011,JPO&INPIT |
