发明名称 SUBSTRATE FOR MOUNTING ELEMENT AND PROCESS FOR ITS PRODUCTION
摘要 To provide a substrate for mounting element having sulfurization resistance improved by increasing planarity of the surface of a thick conductor layer. The substrate 10 for mounting element of the present invention has such a structure that on a surface of a LTCC substrate or ceramics substrate as an inorganic insulating substrate 1, a thick conductor layer 2 is formed as an element connection terminal. The thick conductor layer 2 is made of a metal composed mainly of silver (Ag) or copper (Cu) and formed by printing and firing a metal paste. This thick conductor layer has its surface planarized by wet blast treatment to a surface roughness Ra of at most 0.02μm. A Ni/Au-plated layer 3 is formed on the thick conductor layer 2, so that the surface of the thick conductor layer 2 is completely covered without any space.
申请公布号 US2011186336(A1) 申请公布日期 2011.08.04
申请号 US20100955488 申请日期 2010.11.29
申请人 ASAHI GLASS COMPANY, LIMITED 发明人 NAKAYAMA KATSUYOSHI
分类号 H05K1/03;H05K3/10 主分类号 H05K1/03
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