PREPARING METHOD OF PHOTOELECTRODE BY USING INTERFERENCE LITHOGRAPHY AND DYE-SENSITIZED SOLAR CELL HAVING PHOTOELECTRODE PREPARED BY THE SAME

摘要

PURPOSE: A method for manufacturing photoelectrode and a dye-sensitized solar cell including photoelectrode thereof are provided to improve the photo conversion efficiency of a dye-sensitized solar cell by reducing process time, which is required to form a porous transition metal oxide layer for forming a photoelectrode, and improving the pore structure for dye sorption. CONSTITUTION: A photoresist layer is formed on the top of a conductive transparent substrate(10). A 3D porous photoresist pattern is formed by irradiating a 3D optical interference pattern on the photoresist layer using 3D optical interference lithography. A transition metal oxide precursor solution is injected into the 3D porous photoresist pattern. A porous transition metal oxide layer is formed by eliminating the photoresist pattern with a plasticity process. A photosensitive dye is adsorbed in the porous transition metal oxide layer.