发明名称 |
METHOD OF MANUFACTURING POLISHING PAD HAVING DETECTION WINDOW AND POLISHING PAD HAVING DETECTION WINDOW |
摘要 |
<p>METHOD OF MANUFACTURING POLISHING PAD HAVING DETECTION OF THE DISCLOSUREA polishing pad having a detection window and a method of manufacturing thepolishing pad are provided. A dummy detection window is pre-disposed in a mold.A polishing layer precursor is filled into the mold, and then a solidifying process isperformed to form a polishing layer, wherein the polishing layer and the dummydetection window are separable completely. The polishing layer and the dummydetection window are separated from each other so as to form a detection opening in thepolishing layer. The detection opening can alternatively be formed in a mold having aprotrusion structure to replace the dummy detection window. A detection windowprecursor is filled into the detection opening, and then a solidifying process isperformed to form a detection window.Figures 1A - 1D</p> |
申请公布号 |
SG172519(A1) |
申请公布日期 |
2011.07.28 |
申请号 |
SG20100049617 |
申请日期 |
2010.07.08 |
申请人 |
IV TECHNOLOGIES CO., LTD. |
发明人 |
PAI KUN-CHE;LI SHIUAN-TZUNG;WANG CHAO-CHIN;YANG WEI-WEN |
分类号 |
(IPC1-7):B24D18/00;B24D13/20 |
主分类号 |
(IPC1-7):B24D18/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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