发明名称 METHOD OF MANUFACTURING POLISHING PAD HAVING DETECTION WINDOW AND POLISHING PAD HAVING DETECTION WINDOW
摘要 <p>METHOD OF MANUFACTURING POLISHING PAD HAVING DETECTION OF THE DISCLOSUREA polishing pad having a detection window and a method of manufacturing thepolishing pad are provided. A dummy detection window is pre-disposed in a mold.A polishing layer precursor is filled into the mold, and then a solidifying process isperformed to form a polishing layer, wherein the polishing layer and the dummydetection window are separable completely. The polishing layer and the dummydetection window are separated from each other so as to form a detection opening in thepolishing layer. The detection opening can alternatively be formed in a mold having aprotrusion structure to replace the dummy detection window. A detection windowprecursor is filled into the detection opening, and then a solidifying process isperformed to form a detection window.Figures 1A - 1D</p>
申请公布号 SG172519(A1) 申请公布日期 2011.07.28
申请号 SG20100049617 申请日期 2010.07.08
申请人 IV TECHNOLOGIES CO., LTD. 发明人 PAI KUN-CHE;LI SHIUAN-TZUNG;WANG CHAO-CHIN;YANG WEI-WEN
分类号 (IPC1-7):B24D18/00;B24D13/20 主分类号 (IPC1-7):B24D18/00
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