发明名称 REACTION SUBSTRATE PRODUCTION METHOD AND REACTION SUBSTRATE PRODUCTION DEVICE
摘要 PROBLEM TO BE SOLVED: To perform a stable measurement in a short time. SOLUTION: The reaction substrate production method comprises cooling the reaction substrate 1 having wells 10 below a solidification temperature, and then injecting a liquid containing a reagent into the wells 10 of the reaction substrate 1 from a reagent injection portion 25 to produce the reaction substrate 1 on which the reagent is solidified. Since the liquid containing the reagent is adhered to the wells 10 in a frozen state, the liquid can be solidified in a stable state without being contaminated with impurities causing noises and without drying the reagent, and further since the reagent is preliminarily solidified to the wells 10, the measurement can be started only by injecting a specimen solution. Thus, the stable measurement can be performed in a short time. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011139641(A) 申请公布日期 2011.07.21
申请号 JP20100000761 申请日期 2010.01.05
申请人 SONY CORP 发明人 OTO YASUNORI
分类号 C12N15/09;G01N35/02;G01N37/00 主分类号 C12N15/09
代理机构 代理人
主权项
地址