METHOD AND PROGRAM OF VERIFYING SEMICONDUCTOR DEVICE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method and program of verifying a semiconductor device pattern, with which computational loads can be reduced and computational time can be reduced.

SOLUTION: The method of verifying a semiconductor device pattern includes: a first step (ST11) to calculate a mask pattern; a second step (ST12) to calculate the shape of a photoresist formed on a semiconductor substrate; a third step (ST13) to perform uniform resizing using graphic processing and calculate only artificial temporary processing forms; a fourth step (ST14) to graphically verify whether a designing pattern is formed on the semiconductor substrate or not and to detect potentially risky places; and a fifth step (ST15) to simulate processing of the potentially risky places and calculate partial processing forms.

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