发明名称 POLYSILICON FILM, THE METHOD FOR FABRICATION THEREOF, THIN FILM TRANSISTOR WITH THE POLYSILICON FILM AND ORGANIC LIGHT EMITTING DISPLAY DEVICE WITH THE THIN FILM TRANSISTOR
摘要 <p>PURPOSE: A polysilicon layer, a manufacturing method thereof, a thin film transistor using the same, and an organic light emitting display device are provided to increase the amount of on-current and to reduce leakage current by using a polysilicon layer as an active layer. CONSTITUTION: An amorphous silicon layer is formed on a buffer layer above a substrate. A catalyst metal layer is formed on the amorphous silicon layer so as to obtain the density of 1011-1015 atom/cm2. The catalytic metal of the catalyst metal layer is diffused into the amorphous silicon layer and a crystallization seed having a shape of a pyramid is formed on an interface between the amorphous silicon layer and the buffer layer. A silicon crystal is grown by the crystallization seed so as to form the polysilicon layer.</p>
申请公布号 KR101050467(B1) 申请公布日期 2011.07.20
申请号 KR20100034388 申请日期 2010.04.14
申请人 SAMSUNG MOBILE DISPLAY CO., LTD. 发明人 CHUNG, YUN MO;LEE, KI YONG;SEO, JIN WOOK;LEE, KIL WON;CHOI, BO KYUNG
分类号 H01L29/786;H01L21/324;H01L51/05;H01L51/50 主分类号 H01L29/786
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