发明名称 |
POLYSILICON FILM, THE METHOD FOR FABRICATION THEREOF, THIN FILM TRANSISTOR WITH THE POLYSILICON FILM AND ORGANIC LIGHT EMITTING DISPLAY DEVICE WITH THE THIN FILM TRANSISTOR |
摘要 |
<p>PURPOSE: A polysilicon layer, a manufacturing method thereof, a thin film transistor using the same, and an organic light emitting display device are provided to increase the amount of on-current and to reduce leakage current by using a polysilicon layer as an active layer. CONSTITUTION: An amorphous silicon layer is formed on a buffer layer above a substrate. A catalyst metal layer is formed on the amorphous silicon layer so as to obtain the density of 1011-1015 atom/cm2. The catalytic metal of the catalyst metal layer is diffused into the amorphous silicon layer and a crystallization seed having a shape of a pyramid is formed on an interface between the amorphous silicon layer and the buffer layer. A silicon crystal is grown by the crystallization seed so as to form the polysilicon layer.</p> |
申请公布号 |
KR101050467(B1) |
申请公布日期 |
2011.07.20 |
申请号 |
KR20100034388 |
申请日期 |
2010.04.14 |
申请人 |
SAMSUNG MOBILE DISPLAY CO., LTD. |
发明人 |
CHUNG, YUN MO;LEE, KI YONG;SEO, JIN WOOK;LEE, KIL WON;CHOI, BO KYUNG |
分类号 |
H01L29/786;H01L21/324;H01L51/05;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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