发明名称 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
摘要 A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.
申请公布号 US2011170079(A1) 申请公布日期 2011.07.14
申请号 US200913062872 申请日期 2009.04.30
申请人 ASML NETHERLANDS B.V 发明人 BANINE VADIM YEVGENYEVICH;LOOPSTRA ERIK ROELOF;IVANOV VLADIMIR VITALEVICH;KRIVTSUN VLADIMIR MIHAILOVITCH
分类号 G03B27/54;H01J1/50 主分类号 G03B27/54
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