发明名称 |
ACID-ETCH RESISTANT, PROTECTIVE COATINGS |
摘要 |
New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
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申请公布号 |
US2011171478(A1) |
申请公布日期 |
2011.07.14 |
申请号 |
US20100718516 |
申请日期 |
2010.03.05 |
申请人 |
BREWER SCIENCE INC. |
发明人 |
TANG TINGJI;XU GU;ZHONG XING-FU;HONG WENBIN;FLAIM TONY D.;YESS KIMBERLY;TRICHUR RAMACHANDRAN K. |
分类号 |
C09D145/00;B32B13/12;B32B15/08;B32B17/10;B32B27/00;B32B27/08;G03F7/004;G03F7/20;H05K13/00 |
主分类号 |
C09D145/00 |
代理机构 |
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