发明名称 BASE ISOLATION REPAIR STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a base isolation repair structure effectively attaining base isolation without carrying out large-scale reinforcement to columns and beams of an existing building. SOLUTION: The base isolation repair structure for forming a base isolating layer above a foundation of an existing building includes base isolating devices 12 interposed at cut parts of columns 10 cut above the foundation, and a hanging wall 13 provided hanging from an existing beam 11a on the upper side of the base isolating devices 12 and provided abutting on columns 10a on the upper side, and/or a spandrel wall 14 provided rising from a lower beam 11b on the lower side of the cut parts and provided abutting on columns 11b on the lower side. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011137309(A) 申请公布日期 2011.07.14
申请号 JP20090296849 申请日期 2009.12.28
申请人 TAISEI CORP 发明人 FUJIMURA TASHIRO;SUZUKI HIROMI;NAGAI YUTAKA;KANEDA KAZUHIRO
分类号 E04G23/02;E04H9/02 主分类号 E04G23/02
代理机构 代理人
主权项
地址