SUBSTRATE COVER AND CHARGED PARTICLE BEAM DRAWING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a substrate cover having an antistatic function and achieving position detection of a substrate edge and alignment of the substrate in a mounted state on the substrate, and to provide a charged particle beam drawing method using the same.

SOLUTION: The substrate cover 40 includes a conductive part 41 of the shape corresponding to a peripheral edge region of the substrate. At least a part of the conductive part has a transmission part 47 constituted of a light-transmissive member and hence is configured such that desired light passes through at least a part of the conductive part. The position of the edge part of the substrate is detected by disposing the substrate with the substrate cover 40 mounted between a light irradiating means and a light-receiving part and transmitting irradiating light which is directed from the irradiating means above the substrate to the edge part of the substrate through at least a part of the substrate cover 40 to illuminate the edge part of the substrate.

COPYRIGHT: (C)2011,JPO&INPIT