| 摘要 |
PURPOSE: An apparatus for processing plasma with a high radio frequency power and an electrode used therefore are provided to control high frequency field strength by forming the conductive adhesive layer formed in a junction part between a dielectric substance and a base material. CONSTITUTION: A processing container is decompressed. A dielectric substance(205) is made of the same material as the base material(105a) and is laid under the material. An electrode is formed within the processing container. A high radio frequency power is supplied into the processing container. A conductive adhesive layer(210a) is formed in the junction part between a dielectric substance and a base material. |
