LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

摘要

PURPOSE: A lithographic apparatus and a method for operating the lithographic apparatus are provided to locate a liquid supply system at a specific location on a substrate table for a long time, thereby reducing error. CONSTITUTION: A substrate table supports a substrate(W). A fluid handling structure provides liquid to a space between the fluid handling structure and a projection system(PS) or the substrate table. The substrate table comprises a thermally isolated area. The thermally isolated area is located at a location next to the edge of the substrate table which passes the lower part of the fluid handling structure while the substrate table moves from the lower part of the projection system.